Ion Beam Etching
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작성자최고관리자 댓글 0건 조회 65회 작성일 25-03-19 11:16본문
Ion Beam Etching - Ion Beam Etching System
Concept : RF ion beam etching with load lock chamber
- Hardware Specification -
Available Substrate Size, diameter : Up to 200mm
* Bigger substrate sizes are available on customer's request
Load Lock Chamber with Automatic Handling Robot
* Manual loading is available on customer's request
Gridded RF Ion Beam Source with Neutralizer
Substrate Holder : Tiltable and rotatable holder
Substrate Cooling : Temperature adjustable substrate stage water cooling and helium backside cooling
Pumping System : Turbo molecular pump with dry pump
* Cryogenic pump is available on customer's request
Process Gas : Many differnet gases are available, supplied by mass flow controller
System Control : Fully automatic control
* Please send your inquiry to vac-tec@vac-tec.co.kr if you need more details
- Hardware Specification -
Available Substrate Size, diameter : Up to 200mm
* Bigger substrate sizes are available on customer's request
Load Lock Chamber with Automatic Handling Robot
* Manual loading is available on customer's request
Gridded RF Ion Beam Source with Neutralizer
Substrate Holder : Tiltable and rotatable holder
Substrate Cooling : Temperature adjustable substrate stage water cooling and helium backside cooling
Pumping System : Turbo molecular pump with dry pump
* Cryogenic pump is available on customer's request
Process Gas : Many differnet gases are available, supplied by mass flow controller
System Control : Fully automatic control
* Please send your inquiry to vac-tec@vac-tec.co.kr if you need more details
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